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Lim, Chong Wee
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Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
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Lim
,
Chong
Wee
Published 1998
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Related Subjects
Design
Integrated circuits
Materials
Metal oxide semiconductors, Complementary
Silicides
Titanium
Ultra large scale integration
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