Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /

Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /

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書目詳細資料
主要作者:	Lim, Chong Wee
格式:	Thesis 圖書
語言:	English
出版:	1998.
主題:	Silicides. Integrated circuits > Ultra large scale integration > Materials. Metal oxide semiconductors, Complementary > Design Titanium.
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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